Holomorphic Mappings for Integrated Garment and Motif Design

Year: 2025 Authors: Loe Feijs; Rong-Hao Liang; Holly Krueger; Marina Toeters

Core claim

Holomorphic mappings can integrate garment pattern geometry and motif geometry so repeating designs continue seamlessly across complex panels.

Topics

garment pattern mapping, motif morphing, conformal geometry, fashion design

Domains

complex analysis, holomorphic functions, harmonic conjugates, conformal mapping, fashion design, textile patterning, digital fabric printing, wearable design

Methods

custom software, coordinate mapping, exponential mapping, panel prototyping

Media

garment panels, printed motifs, dress, catwalk showpiece

Source status

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